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Performance of Double-Pole Four-Throw Double-Gate RF CMOS Switch in 45-nm Technology

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dc.contributor.author Srivastava, Viranjay M.
dc.date.accessioned 2016-10-26T11:24:55Z
dc.date.available 2016-10-26T11:24:55Z
dc.date.issued 2010-10
dc.identifier.citation Wireless Engineering and Technology , 2010, 1, 47-54 en_US
dc.identifier.uri http://dx.doi.org/10.4236/wet.2010.12008
dc.identifier.uri http://hdl.handle.net/123456789/1059
dc.description.abstract In this paper, we have investigated the design parameters of RF CMOS switch, which will be used for the wireless tele-communication systems. A double-pole four-throw double-gate radio-frequency complementary-metal-oxide-semicon- ductor (DP4T DG RF CMOS) switch for operating at the 1 GHz is implemented with 45-nm CMOS process technology. This proposed RF switch is capable to select the data streams from the two antennas for both the transmitting and receiving processes. For the development of this DP4T DG RF CMOS switch we have explored the basic concept of the proposed switch circuit elements required for the radio frequency systems such as drain current, threshold voltage, resonant frequency, return loss, transmission loss, VSWR, resistances, capacitances, and switching speed. en_US
dc.language.iso en en_US
dc.publisher Scientific Research Publishing en_US
dc.subject 45-nm Technology en_US
dc.subject Capacitance of Double-Gate MOSFET en_US
dc.subject DG MOSFET en_US
dc.subject DP4T Switch en_US
dc.subject Radio Frequency en_US
dc.subject RF Switch en_US
dc.subject Resistance of Double-Gate MOSFET en_US
dc.subject VLSI en_US
dc.title Performance of Double-Pole Four-Throw Double-Gate RF CMOS Switch in 45-nm Technology en_US
dc.type Article en_US


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